you are asked to fabricate a miniature force sensor, where a load applied as shown below displaces the beam and reduces the gap between the aluminum beam the bottom boron- diffused conductive region, thereby changing the capacitance of the air-gap capacitor. a) develop a microfabrication process to produce this device (describe what deposition, etching, and patterning methods you would use for each major step) b) draw the process flow using both side and top views of the device (drawings need to near and color/hatch-coded) c) draw each 2d photo-mask to be used for the process aluminum boron diffusion silicon (n-type) silicon dioxide